XPP Specifications
Scientific Capabilities
Scientific Applications | Femtosecond Structural Dynamics |
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X-ray Interactions with Matter | |
X-ray Techniques | Wide Angle X-ray Scattering/Diffraction |
Small Angle X-ray Scattering | |
X-ray Absorption Spectroscopy | |
X-ray Emission Spectroscopy |
Source Parameters
Undulator | 28 planar hybrid undulators (30 mm gap) |
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Source Size | ~ 40 microns FWHM |
Repetition Rate | Single pulse, 0.5, 1, 5, 10, 30, 60, 120 Hz |
Pulse Duration | 40 fs (nominal) |
100-200 fs in chirped beam mode | |
< 20 fs in short pulse mode | |
Pulse Energy | 2 mJ nominal |
~ 0.5 mJ in chirped beam mode | |
0.2 mJ in short pulse mode | |
Bandwidth | ~ 0.1% in nominal and short pulse mode (example spectra) |
Up to 1% in chirped beam mode (example spectra) | |
Harmonic Content | ~1% for 3rd Harmonic |
Polarization | Vertical (from the undulators), horizontal and circular (with a diamond phase retarder) |
XPP Photon Beam Properties
Energy Range | 4-25 keV (fundamental) |
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10-25 keV (harmonics) | |
Beam Size | ~ 0.5 mm FWHM (unfocused) |
Down to 3 x 3 μm FWHM focused (Beryllium lenses) | |
Energy Resolution (ΔE/E) | Main beamline monochromator Silicon (111): 1.4 x 10-4 , Diamond (111): 0.6 x 10-4 , Postmono(High quality channelcut crystal) Si(440):0.1 x 10-4, Si(660):0.03 x 10-4 |
Beamline Control | UNIX Workstation, Linux PC, VME-based EPICS control system, Python based control software |
Optical Laser Properties
Wavelength | 800 nm fundamental (nominal) |
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Harmonic Crystals (400 nm, 266 nm) | |
OPA (478-590 nm) | |
Other wavelengths (Intense THz, Mid-IR) availible upon request | |
Pulse Energy | 10 mJ (800 nm) |
1 mJ (400 nm) | |
0.3 mJ (266 nm) | |
OPA (> 50 μJ) | |
Pulse Duration | 45 fs FWHM |
Up to 5 ps chirped | |
Timing | ~ 200 fs FWHM time resolution |
~ 0.5 ps/hr stability |
Detectors
ePix10k 2M | 1470 x 1470 pixels |
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100 x 100 μm2 pixel size | |
1 photon sensitivity at 8 keV | |
104 per pixel dynamic range at 8 keV | |
120 Hz readout rate | |
ePix100 | 388 x 370 pixels |
50 x 50 μm2 pixel size | |
single photon sensitivity at 8 keV | |
102 per pixel dynamic range at 8 keV | |
120 Hz readout rate | |
Jungfrau1M (0.5M) | 1024 x 1024 (1024 x 512) pixels |
75 x 75 μm2 pixel size | |
1 photon sensitivity at 8 keV | |
104 per pixel dynamic range at 8 keV | |
120 Hz readout rate |
Diagnostics
Relative Intensity Monitor | ~0.5% with > 0.2 mJ incident pulse energy |
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XPP CONTACT INFO
Takahiro Sato
Instrument Lead Scientist (Methodology/X-ray optics)
(650) 926-3749
takahiro@slac.stanford.edu
Diling Zhu
Scientist(Methodology/X-ray optics)
(650) 926-2913
dlzhu@slac.stanford.edu
Yanwen Sun
Scientist(XPCS/X-ray optics)
(650) 926-2562
yanwen@slac.stanford.edu
Roberto Alonso-Mori
Scientist (Spectroscopy)
(650) 926-4179
robertoa@slac.stanford.edu
Hasan Yavas
Scientist (IXS/RIXS)
(650) 926-3084
yavas@slac.stanford.edu
Matthias Hoffmann
Laser Scientist
(650) 926-4446
hoffmann@slac.stanford.edu
Adam White
XPP Area Manager
(650) 926-4778
adamwh@slac.stanford.edu
Daniel Stefanescu
XPP technical advisor
(650) 926-3662
daniel@slac.stanford.edu
Vincent Esposito
Controls and DAQ Engineer
(650) 926-3410
espov@slac.stanford.edu
Ying Chen
Mechanical Engineer
yingchen@slac.stanford.edu
Matthieu Chollet
Scientist
(650) 926-3458
mchollet@slac.stanford.edu
Control Room: (650) 926-1703
XPP Hutch: (650) 926-7463